The PlasmaPro 100 Estrelas platform is designed to give total flexibility for Deep Reactive Ion Etching (DRIE) applications - serving a diverse set of process requirements across the Micro Electromechanical Systems (MEMS), Advanced Packaging and Nanotechnology markets. Developed for research and volume production, the PlasmaPro 100 Estrelas offers the ultimate flexibility with Bosch and Cryogenic processes.
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