It's 2 AM and here I am learning about photolithography
@Time-cc2qb
2 жыл бұрын
Same
@ddd15557
Жыл бұрын
almost 3am ;D
@ChandanKumar-dv1wl
Жыл бұрын
Kon se branch se ho bro aur kon sa college?
@saisriram4262
7 ай бұрын
Engineer
@alo1236546
6 ай бұрын
So u know how to use the sun beam
@SarvanCreation
3 жыл бұрын
Its a very good information and knowledge thank you sir
@aymenbouhentala7978
Жыл бұрын
great job sir thank you very much for the great explanation
@nighthawkviper6791
2 жыл бұрын
Or even the specific pattern to diffract visible light. -Cloaking-
@aravindbalakrishnan4254
2 жыл бұрын
Thank you sir. This is very useful in such a way like me also understable.
@tanwiransari
4 жыл бұрын
Good explanation...
@jerryyang2202
10 ай бұрын
usually leaving a metal film pattern on silicon, first deposit a metal film on top of silicon substrate either PVD or CVD, then applied photo-resist on top of metal film, then define the pattern by lithography , then develop the photoresist , then etching process remove the unnecessary area , finally remove the resist film.
@nilupulpiyumantha2108
Жыл бұрын
Thanks for the explanation🔥
@sabrinacheah14
4 жыл бұрын
thank you so much
@Hz-mp8pj
4 жыл бұрын
Nice :)
@cosanostra8341
2 жыл бұрын
thank you very much for the video. Could you please tell me what are the reasons of the apparance of the stitching lines and why some lithography machines cause this problem and others dont cause this problem?? thank you!
@kajal55772
Жыл бұрын
best video on lithography
@ozzyozz4494
3 жыл бұрын
Good video
@Inderjitsingh-hn1gh
3 жыл бұрын
Brilliant
@jinsubpark7317
3 жыл бұрын
easy to understand
@nighthawkviper6791
2 жыл бұрын
Great way to make a smart skin for a WEAV
@NoReplyAsset
3 жыл бұрын
👀👀👀 sounds like silkscreen printing tbh
@peymanfiroozy3602
Жыл бұрын
Great explanations, thanks! What software do you use to create these videos?
@santaislam716
4 жыл бұрын
Easy to understand. What is used as substrate on which resist is coated? Thank you
@radhikapriyadarshini111
3 жыл бұрын
substrate depends upon the requirement ex: MEMS SOI/ Optics Si02/ SAW filters Quartz etc.
@unvergebeneid
3 жыл бұрын
For chips: silicon.
@mahoneytechnologies657
3 ай бұрын
Hewlett Packard was doing this in the early 1980s!
@gunterstruck6838
2 жыл бұрын
cool 🙂
@ChristianStout
3 ай бұрын
Is this also known as "direct-etch lithography", or is that something completely different?
@ichabodon
2 жыл бұрын
I was lost in the first ten seconds! But still interesting
@xxlifestonerxx2085
3 жыл бұрын
So this is how its done.
@Jkauppa
3 жыл бұрын
how much data as byte or bits as 1x1nm squares per eletron beam writing to manufacture a whole semi disc at one "write"?
@Jkauppa
3 жыл бұрын
would you do a prototype (for me) starting a dvd-rom/rw drive with vacuum, electron-xray-sem and multiple ion-plasma-deposition print headers
@Jkauppa
3 жыл бұрын
contact my business address if interested, I'm a microelectronic IC professional developer and designer
@Jkauppa
3 жыл бұрын
starting with hard drive sem disc drives, clear and set operations
@donoi2k22
3 жыл бұрын
How are the masks printed so accurately?
@MOHAMEDBRAHAM1986
3 жыл бұрын
Using ebeam lithography to write masks
@radhikapriyadarshini111
3 жыл бұрын
masks are designed generally Using CLEWIN software, later they are written on soda lime Cr coated masks, written and developed perfectly using optical direct-write lithography system (ex: upg heidelberg machine)
@brooks274
2 жыл бұрын
It takes forever, but its a very accurate process.
@Ljosi
2 жыл бұрын
The first masks were done by hand and later those computers made with those hand made masks were used to make more precise masks and then those computers were used to make even more precise masks ad infinitum.. Similar to how the first ever program had to be written by manually setting the flip flops in RAM and later that program was used to write other programs by using a keyboard etc. Kind of a self bootstrapping progression
@user-nd2tp5yv6l
6 ай бұрын
NIL and X-ray lithography: Am I a joke for you?
@juancarlosdominguezsolis.4665
4 жыл бұрын
resist what compount is?
@Raith
4 жыл бұрын
Most EBL resists are polymers like PMMA
@sukhendumaity8028
3 жыл бұрын
Dear sir I need operational manual for elphy quantum
@alokms9052
3 жыл бұрын
005
@alokms9052
3 жыл бұрын
😍😘😘😍😘😍
@NickyNightShine
3 жыл бұрын
So if EBL can go past 10nm why does Intel insist on EUV? Cost?
@shadowshadow2724
3 жыл бұрын
printing chips with EBL is slow so it used just for making masks and prototyping but EUV used for mass production ,it shines the light and it pass trough the mask and you have the pattern in silicon wafer .
@AlexJoneses
2 жыл бұрын
its like saying "my 3d printer can make such detailed intricate models, why does injection molding even exist," mainly because int his case, 3d printing is used for prototyping, but is far too slow and costly to mass manufacture, which is where injection molding shines because it is faster and cheaper (after you've made a certain amount of parts)
@hashim64
5 ай бұрын
kzitem.info/news/bejne/mIShxZ5_ooKdaH4
@yeeeehawwww9239
4 ай бұрын
Bruh ancient pyramid layouts n shit are obviously fucking computer chips dude . WTh . That shit all hella covered in quartz dawg
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